The Plasma Chemistry Award is the highest recognition awarded by the International Plasma Chemistry Society (IPCS) for lifetime achievements in the field of Plasma Chemistry.
We are delighted to announce, on behalf of the Board of Directors of the IPCS, that the recipient of the 2021 Plasma Chemistry Award will be Dr Tony Murphy of CSIRO, Sydney, Australia, and the recipient of the 2023 Plasma Chemistry Award will be Dr Francoise Massines of CNRS, Perpignan, France.
Dr Murphy has been part of our community for some decades. He was Joint Chair of the 21st International Symposium on Plasma Chemistry in 2013 and President of the International Plasma Chemistry Society in 2018-19. He has published over 300 journal papers and is an Editor-in-Chief of Plasma Chemistry and Plasma Processing. Most of his research has concerned thermal plasmas, including optical diagnostics, transport properties, computational modelling and applications such as waste destruction, arc welding and wire-arc additive manufacturing. In recent years, he has also worked on plasma catalysis.
Dr. Francoise Massines is a very active member of our community and served on the Board of Directors of the International Plasma Chemistry Society in 2013-2017. She has significantly contributed to the fundamental understanding and the rise of low-temperature atmospheric pressure plasmas and has pioneered their development in the field of materials surface processing and thin film deposition. Her accomplishments have been recognized by numerous awards, including the Medaille d’Argent of the French National Centre for Scientific Research in 2014 and the Ulrich Kogelschatz Lecture Award in 2020.
Link to IPCS website for List of Plasma Chemistry Awardees
Dr Anthony Murphy
CSIRO, Sydney, Australia
Plasma Chemistry Award plenary lecture:
Modelling thermal plasmas for industry – from waste destruction to 3D printing
Dr Francoise Massines
CNRS, Perpignan, France
Plasma Chemistry Award plenary lecture:
From glow and Townsend dielectric barrier discharges to atmospheric pressure PECVD
